SQ Series
SU-8 Epoxy Photoresists
The SQ Series is an SU-8 negative tone photoepoxy designed for polymeric MEMS, microfluidics, micromachining and other permanent microelectronic applications. SQ resists are sensitive to NUV, i-line and broadband wavelengths. Film thicknesses from 2 to 200 microns.
For use in permanent applications including MEMS, micro arrays, VSCEL, waveguides, antennas, sensors, microfluidics, PDMS molding, pixel walls, fluidic channels, inkjet nozzles, spacers
5 reasons
TO SWITCH TO SQ SERIES SU-8 PHOTOEPOXY
Plug-n-Play
SQ resists are fully compatible with established SU-8 lithographic processes. Pull out SU-8 negative epoxy and plug in KemLab SQ.
Lower Pricing
SQ is designed to be competitive in the market with prices that beat the competition. Better quality for less cost. Contact KemLab or our distributors for more information and pricing.
Superior Raw Materials
Start with better materials, make a better product. SQ Series SU-8 epoxy resist uses a superior quality resin specially designed for the microelectronics industry. This superior resin manufacturing process produces a cleaner, more consistent negative epoxy photoresist with fewer particles, more transparency, and fewer microbubbles.
Better Optical Transparency
SQ Series SU-8 resin material is visually cleaner, less yellow and more transparent resulting in improved transmission and resistance to oxidative yellowing versus legacy SU-8 products.
Application-Focused Quality Control
Value-added testing was identified and implemented to benefit specific microfluidic and optical industry requirements.
