PMMA e-Beam Resists

HARP PMMA and Copolymer

e-Beam Resists

™

HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

Applications
• e-Beam direct write lithography
• Multi-layer T-gate manufacture
• X-Ray LIGA
• Protective Coating for wafer thinning

Safe Solvent
KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate)

Volumes & Customization

Resist sizes available: 100ml, 500ml, 1L, 4L

Developer sizes available: 4L

Custom dilutions are available upon request

Comparison of high resolution e-Beam resists

Product	Approximate FT (microns) at 2000 rpm	Competitive Product
1000 HARP eB 0.1	0.1	950 PMMA A2
1000 HARP eB 0.2	0.2	950 PMMA A3
1000 HARP eB 0.3	0.3	950 PMMA A4
1000 HARP eB 0.4	0.4	950 PMMA A5
1000 HARP eB 0.7	0.7	950 PMMA A6
1000 HARP eB 1.3	1.3	950 PMMA A8
1000 HARP eB 1.7	1.7	950 PMMA A9
1000 HARP eB 2.7	2.7	950 PMMA A11
500 HARP eB 0.07	0.07	495 PMMA A2
500 HARP eB 0.15	0.15	495 PMMA A3
500 HARP eB 0.2	0.2	495 PMMA A4
500 HARP eB 0.3	0.3	495 PMMA A5
500 HARP eB 0.4	0.4	495 PMMA A6
500 HARP eB 0.7	0.7	495 PMMA A8
500 HARP eB 1.5	1.5	495 PMMA A11
HARP-C 0.2	0.2	8.5 MAA EL 6
HARP-C 0.4	0.4	8.5 MAA EL 9
HARP-C 0.5	0.5	8.5 MAA EL 10
HARP-C 0.7	0.7	8.5 MAA EL 11
HARP-C 0.8	0.8	8.5 MAA EL 12