APOL-LO 3200 Hi-Res Negative Lift-Off
Film Thickness: 2 – 10+ microns
Applications: Compound Semiconductors, LED
APOL-LO 3200 Series resist is a negative tone advanced photoresist with Lift-Off profile for i-Line, and broadband applications. It has improved resolution and a wider process window compared to the original negative lift-off KL1600. It is designed for use with industry standard developers. Custom formulations are available to adjust lift-off angle and the photospeed.