Copyright © KemLab™ Inc. 2012-2019. All Rights Reserved.

Woburn, Massachusetts USA

  • LinkedIn Social Icon
  • Twitter Social Icon

APOL-LO 3200

Hi-Res Negative Lift-Off

Description

APOL-LO 3200 Series resist is a negative tone advanced photoresist

with a Lift-Off profile for i-Line, and broadband applications.

  • Improved resolution compared to the KL1600

  • Wider process window compared to the KL1600

  • Film Thickness range of  2 – 10+ μm

  • Designed for use with industry standard developers

  • Customization available to:

    • Adjust Lift-Off Angle

    • Adjust PhotoSpeed

  • Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070

Volumes & Customization

Sizes available: 50ml, 100ml, 250ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

apollo data sheet