APOL-LO 3200

Hi-Res Negative Lift-Off

Description

APOL-LO 3200 Series resist is a negative tone advanced photoresist

with a lift-off profile for i-Line and broadband applications.

  • Improved resolution

  • Wider process latitude

  • Film Thickness range of  2 – 10+ μm

  • Designed for use with industry standard developers

  • Customization available to:

    • Adjust Lift-Off Angle

    • Adjust PhotoSpeed

  • Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070

Volumes & Customization

Sizes available: 50ml sample, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

apollo data sheet

Copyright © KemLab™ Inc. 2012-2020. All Rights Reserved.

Woburn, Massachusetts USA

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