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Image Reversal Resist for High Resolution


KL IR LO Image Reversal Lift-Off

Tone: Positive / Negative

Film Thickness: 1-2 microns


KL IR image reversal series of photoresists are used as either positive and negative photoresist in i-line, g-line and broadband applications. As a negative resist, the KL IR series have excellent thermal stability and are optimized for metallization processes. Develop using standard 0.26N TMAH developers and KL Photoresist Remover or standard NMP removers.

KL IR 15: Designed for straight profiles when used as negative photoresist

KL IR LO 15: Designed for lift-off profiles when used as negative photoresist. Can replace AZ5214E.

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