KL IR LO Image Reversal Lift-Off

Tone: Positive / Negative

Film Thickness: 1-2 microns

Applications: 

KL IR image reversal series of photoresists are used as either positive and negative photoresist in i-line, g-line and broadband applications. As a negative resist, the KL IR series have excellent thermal stability and are optimized for metallization processes. Develop using standard 0.26N TMAH developers and KL Photoresist Remover or standard NMP removers.

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KL IR15: Designed for straight profiles when used as negative photoresist

KL IR LO: Designed for lift-off profiles when used as negative photoresist. Can replace AZ5214E.