Copyright © KemLab™ Inc. 2012-2020. All Rights Reserved.

Woburn, Massachusetts USA

  • LinkedIn Social Icon
  • Twitter Social Icon

Ancillary Chemicals

TMAH 0.26N

Tetramethylammonium hydroxide

KL Spin-On Primer 80/20

  • Point 1

  • Point 2

  • Point 3

  • Competes with 950 PMMA

KL Photoresist Remover

  • Point 1

  • Point 2

  • Point 3

  • Competes with 950 PMMA

MIBK / IPA 1:1 PMMA Developer

HARP PMMA Developer

MIBK / IPA 1:1 - High resolution / Fast develop

MIBK / IPA 1:3 - Highest resolution / Slow develop