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ANCILLARIES 

ebr pg edge bead remover kemlab

KL EdgeClean Edge Bead Remover 1000

Product No. EC75000-40, EC75000-CS

Universal edge bead remover. It is formulated for easy removal of edge beads that form during the spin coat process for a wide range of photoresist materials. 

*Drop-in replacement for EBR PG*

Compatible with:

  • PMGI & Lift-off Resists

  • HARP PMMA & copolymer

  • HARE SQ Negative Epoxy

  • SU-8

  • g-Line, i-Line and DUV resists

Click for data sheet
Email sales@kemlab.com to order

protective surface coating kemlab

PSC-1003 Protective Surface Coating

Product No. PSC1003-10, PSC1003-40, PSC1003-CS

PSC-1003 Protective Surface Coatings are non-imageable wafer surface protection for use during chemical or mechanical processes in microelectronic fabrication.


Email sales@kemlab.com to order

protective surface coating kemlab

PSC-1010 Protective Surface Coating

Product No. PSC1010-10, PSC1010-40, PSC1010-CS

PSC-1010 Protective Surface Coatings are non-imageable wafer surface protection for use during chemical or mechanical processes in microelectronic fabrication.


Email sales@kemlab.com to order

spin on primer 8020 kemlab

KL Spin-On Primer 80/20

Product No. HMD8020-10

KL Spin-on Primer is a blend of 80% PM Acetate and 20% HMDS. The HMDS component is a chemical pre-treatment that increases adhesion to silicon, oxides, nitrides and other surfaces.

photoresist remover kemlab

KL Photoresist Remover

Product No. RM70100-10, RM70100-40, RM70100-CS

NMP solvent-based resist remover


Email sales@kemlab.com to order

DEVELOPERS

tmah kemlab

TMAH 0.26N

Product No. TM026DV-10, TM026DV-40, TM026DV-CS

TMAH 0.26N positive photoresist developer is a high purity formulation of the industry standard 2.38 weight % tetramethyl ammonium hydroxide (TMAH) and 0.261N metal-ion-free developer. It is formulated to meet the microlithographic and process requirements for sub-0.5 µm technology. TMAH 0.26N developer is a non-surfactant material for use in spray and spray-puddle processes.

*Drop-in replacement for AZ® 300 MIF developer*


Email sales@kemlab.com to order

hare sq su8 developer

HARE SQ Developer

Product No. SQ800DV-10, SQ800DV-40, SQ800DV-CS

HARE SQ™ Developer is a solvent-based developer designed to cleanly develop HARE SQ™ epoxy films, leaving vertical profiles with no Line Edge Roughness (LER). KemLab developer is fully compatible with other lithographic epoxies such as SU-8. HARE SQ™ Developer uses only electronic grade materials that are common to the microelectronics industry.

 

ADVANTAGES

  • Clean develop of KemLab HARE SQ™ negative epoxy resist

  • Vertical Sidewall with no LER

  • Fully compatible with other lithographic epoxies such as SU-8

  • Direct replacement for SU-8 Developer 

mibk ipa developer kemlab

MIBK/IPA 1:1 and MIBK/IPA 1:3

Product No. MPA50DV-40, MPA50DV-CS (MIBK/IPA 1:1)
Product No. MPA25DV-40, MPA25DV-CS (MIBK/IPA 1:3)

MIBK:IPA developer is designed for high resolution, high throughput PMMA and copolymer resist processing. MIBK is the solvent and active ingredient, which controls the solubility and swelling of the resist, while IPA is the alcohol (non-solvent). 

ADVANTAGES

  • Optimized for PMMA and copolymer resists

  • Wide range of standard formulations

  • Compatible with spray and immersion processes


Email sales@kemlab.com to order

mibk ipa developer kemlab
Crystal Spheres

ANCILLARIES & DEVELOPERS

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