ANCILLARIES
KL EdgeClean Edge Bead Remover 1000
Product No. EC75000-40, EC75000-CS
Universal edge bead remover. It is formulated for easy removal of edge beads that form during the spin coat process for a wide range of photoresist materials.
*Drop-in replacement for EBR PG*
Compatible with:
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PMGI & Lift-off Resists
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HARP PMMA & copolymer
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HARE SQ Negative Epoxy
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SU-8
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g-Line, i-Line and DUV resists
Click for data sheet
Email sales@kemlab.com to order
PSC-1003 Protective Surface Coating
Product No. PSC1003-10, PSC1003-40, PSC1003-CS
PSC-1003 Protective Surface Coatings are non-imageable wafer surface protection for use during chemical or mechanical processes in microelectronic fabrication.
Email sales@kemlab.com to order
PSC-1010 Protective Surface Coating
Product No. PSC1010-10, PSC1010-40, PSC1010-CS
PSC-1010 Protective Surface Coatings are non-imageable wafer surface protection for use during chemical or mechanical processes in microelectronic fabrication.
*Drop-in replacement for AZ P4K-AP*
Email sales@kemlab.com to order
KL Spin-On Primer 80/20
Product No. HMD8020-10
KL Spin-on Primer is a blend of 80% PM Acetate and 20% HMDS. The HMDS component is a chemical pre-treatment that increases adhesion to silicon, oxides, nitrides and other surfaces.
Click for process sheet
Email sales@kemlab.com to order
KL Photoresist Remover
Product No. RM70100-10, RM70100-40, RM70100-CS
NMP solvent-based resist remover
Email sales@kemlab.com to order
DEVELOPERS
TMAH 0.26N
Product No. TM026DV-10, TM026DV-40, TM026DV-CS
TMAH 0.26N positive photoresist developer is a high purity formulation of the industry standard 2.38 weight % tetramethyl ammonium hydroxide (TMAH) and 0.261N metal-ion-free developer. It is formulated to meet the microlithographic and process requirements for sub-0.5 µm technology. TMAH 0.26N developer is a non-surfactant material for use in spray and spray-puddle processes.
*Drop-in replacement for AZ® 300 MIF developer*
Email sales@kemlab.com to order
HARE SQ Developer
Product No. SQ800DV-10, SQ800DV-40, SQ800DV-CS
HARE SQ™ Developer is a solvent-based developer designed to cleanly develop HARE SQ™ epoxy films, leaving vertical profiles with no Line Edge Roughness (LER). KemLab developer is fully compatible with other lithographic epoxies such as SU-8. HARE SQ™ Developer uses only electronic grade materials that are common to the microelectronics industry.
ADVANTAGES
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Clean develop of KemLab HARE SQ™ negative epoxy resist
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Vertical Sidewall with no LER
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Fully compatible with other lithographic epoxies such as SU-8
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Direct replacement for SU-8 Developer
Click for data sheet
Email sales@kemlab.com to order
MIBK/IPA 1:1 and MIBK/IPA 1:3
Product No. MPA50DV-40, MPA50DV-CS (MIBK/IPA 1:1)
Product No. MPA25DV-40, MPA25DV-CS (MIBK/IPA 1:3)
MIBK:IPA developer is designed for high resolution, high throughput PMMA and copolymer resist processing. MIBK is the solvent and active ingredient, which controls the solubility and swelling of the resist, while IPA is the alcohol (non-solvent).
ADVANTAGES
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Optimized for PMMA and copolymer resists
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Wide range of standard formulations
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Compatible with spray and immersion processes
Email sales@kemlab.com to order
