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KL IR LO
Image Reversal Photoresist
Description
KL IR image reversal series of photoresists are used as either positive and negative photoresist in i-line, g-line and broadband applications. As a negative resist, the KL IR series have excellent thermal stability and are optimized for metallization processes. Develop using standard 0.26N TMAH developers and KL Photoresist Remover or standard NMP removers.
KL IR LO: Designed for lift-off profiles when used as negative photoresist
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Can replace AZ® 5214E
IR15: Designed for straight profiles when used as negative photoresist
Volumes & Customization
Sizes available: 100ml, 500ml, 1L, 4L
Production volumes available
Custom thicknesses and formulations are available by request




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