Description

KL IR image reversal series of photoresists are used as either positive and negative photoresist in i-line, g-line and broadband applications. As a negative resist, the KL IR series have excellent thermal stability and are optimized for metallization processes. Develop using standard 0.26N TMAH developers and KL Photoresist Remover or standard NMP removers.

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KL IR LO: Designed for lift-off profiles when used as negative photoresist

• Can replace AZ® 5214E

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IR15: Designed for straight profiles when used as negative photoresist

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Volumes & Customization

Sizes available: 100ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request