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SQ Series
High Aspect Ratio SU-8 Epoxy Photoresist
Film Thickness 2-100 microns
DESCRIPTION
SQ is an epoxy-based negative photoresist designed for polymeric MEMS, microfluidics, micromachining, and microelectronics. It is optimized for thick film applications from 2 to 100 microns. SU-8 epoxy photoresists create durable images with superior chemical and thermal stability, crucial for thick applications. The SQ Series has vertical sidewalls in thick films suitable for permanent applications.
ADVANTAGES
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KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility from lot-to-lot compared to SU-8 legacy products
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Consistent surface energy of crosslinked resist critical for microfluidic applications
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Fully compatible with SU-8 processes
FEATURES
Chemistry: SU-8 polymer epoxy
Tone: Negative
Film Thickness: Up to 100 μm single coat
Sensitivity: NUV, Broadband, i-line
Developer: SQ Developer, SU-8 PGMEA
Volumes & Customization
Sizes available: 100ml sample, 500ml, 1L, 4L
Production volumes available
Custom thicknesses available by request
EXPOSURE & OPTICAL PARAMETERS
SQ is designed for near UV (350-400nm) exposure wavelengths. Exposure dose will vary depending on the exposure tool set, film thickness, and process conditions. Nominal exposure doses are shown in the Process Guide for broadband exposure with a 360nm cutoff filter at the thicknesses and processes shown.





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