DESCRIPTION
SQ is an epoxy-based negative photoresist designed for polymeric MEMS, microfluidics, micromachining, and microelectronics. It is optimized for thick film applications from 2 to 100 microns. SU-8 epoxy photoresists create durable images with superior chemical and thermal stability, crucial for thick applications. The SQ Series has vertical sidewalls in thick films suitable for permanent applications.

ADVANTAGES

• KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility from lot-to-lot compared to SU-8 legacy products

• Consistent surface energy of crosslinked resist critical for microfluidic applications

• Fully compatible with SU-8 processes

 

FEATURES
Chemistry:          SU-8 polymer epoxy
Tone:                   Negative
Film Thickness:   Up to 100 μm single coat
Sensitivity:           NUV, Broadband, i-line
Developer:          SQ Developer, SU-8 PGMEA

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Volumes & Customization

Sizes available: 100ml sample, 500ml, 1L, 4L

Production volumes available

Custom thicknesses available by request

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EXPOSURE & OPTICAL PARAMETERS
SQ is designed for near UV (350-400nm) exposure wavelengths. Exposure dose will vary depending on the exposure tool set, film thickness, and process conditions. Nominal exposure doses are shown in the Process Guide for broadband exposure with a 360nm cutoff filter at the thicknesses and processes shown.