KL IR image reversal series of photoresists are used as either positive and negative photoresist in i-line, g-line and broadband applications. As a negative resist, the KL IR series have excellent thermal stability and are optimized for metallization processes. Develop using standard 0.26N TMAH developers and KL Photoresist Remover or standard NMP removers.
KL IR LO 15: Designed for lift-off profiles when used as negative photoresist
Can replace AZ® 5214E
LINK TO PRODUCT PAGE: https://www.kemlab.com/image-reversal-photoresist