SQ Series SU-8 Epoxy Photoresists

KemLab SU-8 epoxy photoresists represent a significant advancement in the field of microelectronics, utilizing a high-purity epoxy resin that has been meticulously tailored to meet the stringent demands of this industry. One of the standout features of these photoresists is their ability to maintain enhanced cleanliness throughout the manufacturing process. This is crucial in microelectronics, where even the smallest contaminants can lead to significant defects in the final products. Additionally, the outstanding lithographic consistency of KemLab SU-8 photoresists from batch to batch sets them apart from legacy SU-8 products, ensuring that manufacturers can rely on uniform performance and quality in their applications. This consistency is vital for achieving precise and repeatable results in complex microfabrication processes.

The SQ Series of photoresists is specifically designed as a negative tone photoepoxy, making it particularly suitable for a wide range of applications within the polymeric MEMS (Micro-Electro-Mechanical Systems), microfluidics, and various permanent microelectronic applications. The formulation of SQ resists is optimized to respond to a variety of exposure wavelengths, including Near Ultraviolet (NUV), i-line, and broadband wavelengths. This versatility allows for greater flexibility in processing conditions and compatibility with different lithographic equipment. Furthermore, the film thickness of these photoresists can be adjusted to range from 2 to 200 microns, enabling users to tailor the material properties to fit specific project requirements.

These photoresists are particularly well-suited for permanent applications, which is a critical aspect in the design and manufacturing of advanced microelectronic devices. Applications include MEMS, which have become essential in various sectors such as automotive, consumer electronics, and medical devices. The SQ Series is also ideal for creating micro arrays, VCSEL (Vertical-Cavity Surface-Emitting Laser) structures, waveguides, antennas, and sensors. Moreover, the photoresists facilitate the development of intricate microfluidics systems, which are crucial for applications in biotechnology and chemical analysis. Other notable applications include PDMS (Polydimethylsiloxane) molding, pixel walls for display technologies, fluidic channels essential for various microfluidic devices, inkjet nozzles for precision printing, and spacers that are vital in maintaining the integrity of microstructures. The broad range of applications showcases the versatility and capability of KemLab SU-8 epoxy photoresists in addressing the complex needs of modern microfabrication and microelectronic development.

SQ Series

SQ SU-8 NEGATIVE EPOXY

The SQ Series is a negative photoresist based on SU-8 epoxy, specifically designed polymeric MEMS, microfluidics, micromachining, and microelectronics. It is optimized for thick film applications ranging from 2 to 100 microns. SU-8 epoxy photoresists produce robust images with excellent and thermal stability, essential for thick applications. The SQ Series features vertical sidewalls in thick films, making it ideal for permanent applications.

SQ QuickDry SU-8 NEGATIVE EPOXY - REPLACEMENT FOR SU-8 2000

SQ QuickDry is an epoxy-based negative photoresist tailored for polymeric MEMS, microfluidics, micromachining, and various microelectronic applications. This system is optimized for both thin and thick film up to 200 microns and features a quicker drying solvent system that minimizes processing times, resulting in enhanced throughput.

SQ MicroCoat SU-8 NEGATIVE EPOXY - REPLACEMENT FOR SU-8 6000 TF

SQ MicroCoat resists are epoxy-based negative photoresists designed for thin films, high temperatures and severe chemical applications.  SQ MicroCoat is designed for use in thin films ranging from 0.05 - 2.0 µm and are often used in permanent device applications. Ultra-thin coatings of 50 nm fully cross-linked are achievable and used for imaged surface protection.

SQ OptiCoat SU-8 OPTICAL GRADE NEGATIVE EPOXY - FOR USE IN LIDAR | WAVEGUIDE APPLICATIONS

SQ OptiCoat is an advanced epoxy-based negative photoresist for permanent devices with demanding optical parameters such as waveguides and sensors. SQ OptiCoat is an improved version of SQ. Using patent-pending advanced chemistry, higher transparency can be maintained over a wide temperature range. Film thicknesses of 2 to 100 microns can be achieved with a single spin coat.