WOBURN, MA ― KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of high-resolution direct write e-Beam lithography. HARP™ PMMA and Copolymer e-Beam Resists epitomize excellence through rigorous testing, stringent quality control measures, premium raw materials, consistent lot-to-lot performance, optimized supply chain management, and world-class technical support.
HARP™ PMMA (polymethyl methacrylate) e-Beam resist is specifically formulated for high-resolution direct write e-Beam lithography applications. When combined with HARP-C™ copolymer, the HARP multi-layer system becomes ideal for T-gate manufacture, offering unmatched precision and reliability. HARP™ PMMA exhibits excellent adhesion to a variety of substrates and can be used as a protective coating layer for wafer thinning and sacrificial layers.
The HARP™ PMMA and Copolymer e-Beam Resists offer a wide range of applications, including:
e-Beam direct write lithography
Multi-layer T-gate manufacture
Protective coating for wafer thinning
"We are committed to providing our customers with safe, high-quality materials that meet their specific needs," stated Jeremy Golden, General Manager at KemLab. "With our range of resist sizes and customization options, we can tailor our products to suit a variety of applications and volume requirements."
Key features of HARP™ PMMA and Copolymer e-Beam Resists:
Available in resist sizes of 100ml, 500ml, 1L, and 4L
Developer sizes available in 4L
Custom dilutions available upon request
For inquiries and more information, visit www.kemlab.com or get in touch with KemLab’s expert team today.