New PMMA e-Beam Resists from KemLab - Competing against the 950k and the 495k industry "standards"

HARP PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam (electron beam)

lithography. When combined with HARP-C copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

Applications • e-Beam direct write lithography