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New PMMA e-Beam Resists from KemLab - Competing against the 950k and the 495k industry "standards"

HARP PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam (electron beam)

lithography. When combined with HARP-C copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

Applications • e-Beam direct write lithography • Multi-layer T-gate manufacture • X-Ray LIGA • Protective Coating for wafer thinning

Safe Solvent KemLab HARP PMMA products are manufactured in safe solvents (anisole and ethyl lactate)

Volumes & Customization

Sizes available: 500ml, 1L, 4L

Custom dilutions are available upon request


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