top of page

New PMMA e-Beam Resists from KemLab - Competing against the 950k and the 495k industry "standards"

HARP PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam (electron beam)

lithography. When combined with HARP-C copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

Applications • e-Beam direct write lithography • Multi-layer T-gate manufacture • X-Ray LIGA • Protective Coating for wafer thinning

Safe Solvent KemLab HARP PMMA products are manufactured in safe solvents (anisole and ethyl lactate)

Volumes & Customization

Sizes available: 500ml, 1L, 4L

Custom dilutions are available upon request



164 views

Recent Posts

See All

KemLab Offers Solutions for Lithography

https://www.us-tech.com/RelId/2751777/ISvars/default/KemLab_Offers_Solutions_for_Lithography.htm WOBURN, MA ― KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS ap

Kommentare


bottom of page