HARP PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam (electron beam)
lithography. When combined with HARP-C copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.
Applications • e-Beam direct write lithography • Multi-layer T-gate manufacture • X-Ray LIGA • Protective Coating for wafer thinning
Safe Solvent KemLab HARP PMMA products are manufactured in safe solvents (anisole and ethyl lactate)
Volumes & Customization
Sizes available: 500ml, 1L, 4L
Custom dilutions are available upon request
