DESCRIPTION
SQ QuickDry is an SU-8 epoxy-based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The SQ QuickDry system is designed for use in thin and thick film applications up to 200 microns and utilizes a faster drying solvent system which reduces processing times, leading to increased throughput.
ADVANTAGES
KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility lot-to-lot compared to SU-8 legacy products
Quick drying solvent for increased throughput
High aspect ratio epoxy with vertical sidewalls
Replaces SU-8 2000 series
FEATURES
Chemistry: SU-8 polymer epoxy
Tone: Negative
Film Thickness: Up to 200 μm single coat
Sensitivity: NUV, Broadband, i-line
Developer: SQ Developer, SU-8 PGMEA
SQ QuickDry 2, 5
SQ QuickDry 25, 35, 50, 75