DESCRIPTION
KemLab SQ MicroCoat resists are SU-8 epoxy-based negative photoresists designed for thin films, high temperatures and severe chemical applications. SQ MicroCoat is designed for use in thin films ranging from 0.05 - 2.0 µm and are often used in permanent device applications. Ultra-thin coatings of 50 nm fully cross-linked are achievable and used for imaged surface protection.
ADVANTAGES
KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility lot-to-lot compared to SU-8 legacy products
Minimal film loss
Fully crosslinked at 0.05 µm (50 nm)
Short bake times for high throughput
Consistent surface energy of crosslinked resist
Fully compatible with SU-8 processes
FEATURES
Chemistry: SU-8 polymer epoxy
Tone: Negative
Film Thickness: ~ 0.05 - 2 µm
Sensitivity: NUV, Broadband, i-line
Developer: SQ Developer, SU-8 PGMEA
SQ MicroCoat 0.05, 0.1, 0.25, 0.5, 1.0, 2.0