Film Thickness: 2 – 10+ microns
Applications: Compound Semiconductors, LED
APOL-LO 3200 Series resist is a negative tone advanced photoresist with Lift-Off profile for i-Line, and broadband applications. It is designed for use with industry standard developers.
Wider process latitude
Film Thickness range of 2 – 10+ μm
Designed for use with industry standard developers
Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070