KemLab APOL-LO 3200 Hi-Res Negative Lift-Off

Tone: Negative

Film Thickness: 2 – 10+ microns

Applications: Compound Semiconductors, LED

 

APOL-LO 3200 Series resist is a negative tone advanced photoresist with Lift-Off profile for i-Line, and broadband applications. It is designed for use with industry standard developers.

 

  • Improved resolution

  • Wider process latitude

  • Film Thickness range of  2 – 10+ μm

  • Designed for use with industry standard developers

  • Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070

 

LINK TO PRODUCT PAGE

KemLab APOL-LO 3200 Hi-Res Negative Lift-Off

$0.00Price
Film Thickness
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Woburn, Massachusetts USA

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