HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.
 
HARP-C
MMA/MAA (methyl methacrylate/methacrylic acid) copolymer
Used in multi-layer process with PMMA
Manufactured in Ethyl Lactate
Uses MIBK/IPA developer
Competes with MMA(8.5)MAA
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Applications
• e-Beam direct write lithography
• Multi-layer T-gate manufacture
• X-Ray LIGA
• Protective Coating for wafer thinning
 
Safe Solvent
KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate)
 
LINK TO PRODUCT PAGE: https://www.kemlab.com/pmmaresists