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SQ Series High Aspect Ratio SU-8 Epoxy Photoresist

SQ Series is a SU-8 epoxy photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. This resist has excellent chemical, mechanical and thermal resistance, making it suitable for permanent applications. 

 

Sensitive to NUV, i-line and broadband wavelengths. SQ Series uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors.

 

ADVANTAGES

  • KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility from lot-to-lot compared to SU-8 legacy products

  • Consistent surface energy of crosslinked resist critical for microfluidic applications

  •  Fully compatible with SU-8 processes

 

FEATURES

  • Chemistry: SU-8 polymer epoxy

  • Tone: Negative

  • Film Thickness: Up to 100 μm single coat

  • Sensitivity: NUV, Broadband, i-line

  • Developer: SQ Developer, SU-8 PGMEA

 

LINK TO PRODUCT PAGE

SQ Series High Aspect Ratio SU-8 Epoxy Photoresist

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