SQ Series is a SU-8 epoxy photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. This resist has excellent chemical, mechanical and thermal resistance, making it suitable for permanent applications.
Sensitive to NUV, i-line and broadband wavelengths. SQ Series uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors.
ADVANTAGES
KemLab SU-8 epoxy photoresists use an epoxy resin manufactured for microelectronics with superior cleanliness and excellent lithographic reproducibility from lot-to-lot compared to SU-8 legacy products
Consistent surface energy of crosslinked resist critical for microfluidic applications
Fully compatible with SU-8 processes
FEATURES
Chemistry: SU-8 polymer epoxy
Tone: Negative
Film Thickness: Up to 100 μm single coat
Sensitivity: NUV, Broadband, i-line
Developer: SQ Developer, SU-8 PGMEA