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1000 HARP PMMA

HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

 

1000 HARP PMMA

  • Highest molecular weight (Mw) PMMA polymer

  • Best resolution and contrast PMMA

  • Manufactured in Anisole

  • Uses MIBK/IPA developer

  • Competes with 950 PMMA

Applications
• e-Beam direct write lithography
• Multi-layer T-gate manufacture
• X-Ray LIGA
• Protective Coating for wafer thinning
 

Safe Solvent
KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate)

 

LINK TO PRODUCT PAGEhttps://www.kemlab.com/pmmaresists

1000 HARP PMMA

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