Description

KL 6000 series are positive photoresists for use in i-Line, g-Line and broadband applications. KL6000 offers high sensitivity, high throughput, and excellent process latitude.

• Cover 2.5 – 12 µm in a single coat

• Designed for use with industry standard TMAH 0.26N developers

• No PEB necessary

• Competes with SPR™ 220-3.0/S1827™, SPR™ 220-4.5,   SPR™ 220-7.0, and S1827™

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Volumes & Customization

Sizes available: 100ml sample, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request