KL 6000

General Purpose Thick


KL 6000 series are positive photoresists for use in i-Line, g-Line and broadband applications. KL6000 offers high sensitivity, high throughput, and excellent process latitude.

  • Cover 2.5 – 12 µm in a single coat

  • Designed for use with industry standard TMAH 0.26N developers

  • No PEB necessary

  • Competes with SPR™ 220-3.0/S1827™SPR™ 220-4.5,   SPR™ 220-7.0, and S1827™

Volumes & Customization

Sizes available: 50ml, 100ml, 250ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

kl6000 data sheet

Copyright © KemLab™ Inc. 2012-2020. All Rights Reserved.

Woburn, Massachusetts USA

  • LinkedIn Social Icon
  • Twitter Social Icon