Copyright © KemLab™ Inc. 2012-2019. All Rights Reserved.

Woburn, Massachusetts USA

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KL 5300

General Purpose

Description

KL5300 series are positive photoresists for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.

  • Cover 0 – 2.5 µm in a single coat

  • Designed for use with industry standard TMAH 0.26N developers

  • Achieve resolution 0.55 µm

  • Competes with S1805™, S1808™, S1811™, S1813™, S1818™

Volumes & Customization

Sizes available: 50ml, 100ml, 250ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

kl5300 data sheet