KL 5302

Hi-Res Positive Thin

Description

Designed for film thickness of ~200 nm

  • Applied in interference or holographic lithography

  • Applied in broadband exposure tools or steppers

Volumes & Customization

Sizes available: 50ml, 100ml, 250ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

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