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Woburn, Massachusetts USA

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KL 1600

Negative Lift-Off

Description

KL 1600 Negative Lift-Off Series Resist is a negative photoresist with Lift-Off profile for i-Line, and broadband applications.

  • Wide process window for consistency across substrates, while still retaining ability to adjust resist profile

  • Film Thickness range of 2 – 10 μm

  • Designed for use with industry standard developers

  • Customization available to:

    • Adjust Lift-Off Angle

    • Adjust PhotoSpeed

Volumes & Customization

Sizes available: 50ml, 100ml, 250ml, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request